CTIA's Tungsten Heater in Physical Vapor Deposition (PVD)
Tungsten heater is a resistive heating element used in Physical Vapor Deposition (PVD) systems to heat evaporation materials, enabling vaporization and thin film formation on substrate surfaces. Tungsten heating element is manufactured from high-purity tungsten wire or doped tungsten wire through precision stranding, winding, pressing forming, and surface treatment processes.
Why Use Tungsten Heater for PVD processes? Physical vapor deposition processes require heating elements to operate at extremely high temperatures while maintaining stable evaporation performance. CTIA’s tungsten heater meets the following requirements for PVD applications:
(1) Ultra-high melting point: Tungsten has a melting point of about 3410℃, significantly higher than most coating materials, ensuring structural stability without melting or deformation during evaporation.
(2) Low vapor pressure: Under high vacuum conditions, tungsten exhibits extremely low vapor pressure, effectively preventing contamination from heater material evaporation and ensuring coating purity.
(3) Good wettability: Surface-treated tungsten wire provides excellent wetting behavior with various coating materials, enabling uniform spreading of molten metals and stable evaporation rate with consistent film thickness.
(4) Thermal shock resistance: Low thermal expansion coefficient and strong creep resistance allow the heater to withstand rapid heating and cooling cycles while maintaining structural stability.
Specifications of CTIA’s Tungsten Heater
CTIA GROUP supplies tungsten heaters with multiple specification options:
(1) Material: High-purity tungsten wire or doped tungsten wire.
(2) Wire diameter: 0.2–1.2mm.
(3) Structure: Single strand or multi-strand twisted structures.
(4) Shape: Straight, coil, funnel, U-frame, hook, single-peak, double-peak, and customized geometries.
(4) Surface: Electrolytic polishing or alkali cleaning.
Tungsten heater is widely used in consumer electronics housing decoration, optical lens coating, automotive reflector coating, decorative surface finishing, and semiconductor electrode deposition. It serves as a key evaporation heating component for high-quality thin film formation in PVD processes.
CTIA GROUP has over 30 years of experience in tungsten heater engineering. It provides system-level optimization design based on PVD equipment structure, evaporation material properties, and thermal field distribution requirements. Design parameters include tungsten wire diameter, doping type and content, structural configuration, effective heating length, and lead wire structure. Surface treatments such as electrolytic polishing and alkali cleaning are available to improve surface quality and operational stability, enabling full-process customization from material selection, structural design to precision manufacturing.
For any inquiry, please contact tungsten heater manufacturer: CTIA GROUP
Email: sales@chinatungsten.com
Tel: 0086 592 5129696 / 0086 592 5129595
Website: www.tungsten.com.cn
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