CTIA's Tungsten Heater in Vacuum Deposition
CTIA's tungsten heater is a resistive tungsten heating element made of high purity tungsten wire or doped tungsten wire through precision stranding, coiling, forming, and surface treatment processes, used for heating and evaporating metal or compound materials in vacuum deposition equipment to achieve thin film deposition. As an evaporation source heating component, tungsten heater can realize material evaporation and deposition, and is widely used in semiconductor manufacturing, optical thin film deposition, display device production, and metallization coating applications.
Why Choose Tungsten Heaters for Vacuum Deposition? The heating element directly affects the evaporation stability and film quality of vacuum deposition. Tungsten has a high melting point and can maintain structural stability even under high temperature evaporation conditions; its vapor pressure is low, with less volatilization in a high vacuum environment, which helps reduce impurity introduction and maintain film purity; and its resistance performance is stable, which can continuously convert electrical energy into thermal energy, realizing uniform heating and stable evaporation of evaporation materials through radiation, thereby ensuring the controllability of the deposition process. Therefore, tungsten heaters are widely used in vacuum deposition processes.
Specifications of CTIA’s Tungsten Heater
CTIA GROUP provides multiple specifications based on deposition equipment structure and evaporation material characteristics. Pure tungsten wire or doped tungsten wire with purity ≥99.95% is available to meet different operating temperature and stability requirements. Wire diameter is 0.2~1.2mm. Stranding options include single strand and multi-strand (2, 3, 4, 6 strands) to optimize resistance and mechanical strength. Shapes include coil, spiral, funnel, and groove configurations to match different evaporation methods and loading requirements.
Applications of CTIA’s Tungsten Heater
(1) Metallic thin film deposition: Used for heating and evaporating metals such as aluminum, gold, and silver to form a uniform metal thin film on the surface of the substrate.
(2) Optical coating: Used for thin film deposition of optical components such as lenses and filters to ensure the uniformity and stability of the film layer.
(3) Semiconductor deposition: Used for the vacuum deposition preparation of functional thin films such as conductive layers and barrier layers.
(4) Decorative and functional coatings: Used for surface metallization and functional coating treatment of plastics, ceramics, etc.
(5) Laboratory material research: Used for vacuum evaporation preparation experiments of new thin film materials and nano films.
CTIA GROUP has over 30 years of experience in tungsten heater engineering and specializes in system-level optimization design based on vacuum deposition equipment structure, evaporation material properties, and thermal field distribution requirements. Design parameters include tungsten wire diameter, doping type and content, structural configuration, effective heating length, and lead wire structure. Surface treatments such as electrolytic polishing and alkali cleaning are available to improve surface quality and operational stability, enabling full-process customization from material selection and structural design to precision manufacturing.
For any inquiry, please contact tungsten heater manufacturer: CTIA GROUP
Email: sales@chinatungsten.com
Tel: 0086 592 5129696 / 0086 592 5129595
Website: www.tungsten.com.cn
WeChat:
More info>>
1.Tungsten heater quotation table
2. Catalog of tungsten heater
3. Tungsten heater models
4. Stranded tungsten wire for making tungsten heater