Tungsten Heater in Semiconductor
Tungsten heater is a high-purity tungsten heating element used in semiconductor vacuum processes, enabling wafer metallization, electron-beam heating, and thin-film deposition in Micro-Electro-Mechanical Systems (MEMS) under high-vacuum conditions.
2.Features of CTIA’s Tungsten Heater in Semiconductor
(1) High Temperature Resistance: Tungsten has a melting point of 3410°C, ensuring stable operation without melting or failure under high-vacuum and high-temperature conditions.
(2) Long Anti-Sag Service Life: Doped tungsten wire improves creep resistance through optimized recrystallized grain structure, maintaining geometric stability during long-term operation.
(3) Uniform Thermal Field: Stable resistivity and low thermal expansion ensure consistent heating performance, supporting uniform semiconductor wafer processing.
(4) High Surface Purity: Surface conditions are improved by electrolytic polishing or chemical cleaning to reduce surface contamination and outgassing in semiconductor vacuum environments.
3.Applications of CTIA’s Tungsten Heater in Semiconductor
(1) Metallization Deposition: Used as an evaporation source in vacuum deposition systems for metals such as Au, Al, and Ni on semiconductor wafers.
(2) Micro-Electro-Mechanical Systems (MEMS): Used for multilayer thin-film deposition and precise temperature control in micro-device manufacturing.
(3) Electronic Emission Applications: Used as cathode heating or electron emission sources in vacuum electronic devices and precision electron tubes.
(4) Laboratory Micro/Nano Processing: Used in semiconductor material research to ensure stable deposition rates and process repeatability.
4.Product Parameters of CTIA’s Tungsten Heater
(1) Product Name: Tungsten heater
(2) Product Model: Customizable, including straight, U-frame, funnel, bent, spiral, and other structural types
(3) Material: Pure tungsten wire or doped tungsten wire
(4) Wire Diameter: 0.2–2.0 mm, customizable
(5) Strand: 2–6 strands, customizable
(6) Color: Silver-white
(7) Purity: ≥99.95%
(8) Melting Point: 3410°C ±20°C
(9) Surface Condition: Chemical cleaning or electrolytic polishing
CTIA GROUP has more than 30 years of experience in tungsten heater manufacturing and customization. Based on semiconductor applications, vacuum conditions, and installation space, CTIA systematically optimizes key parameters including wire diameter, doping type and content, structure, overall length, effective heating length, bending angle, and support positions. Surface treatments such as electrolytic polishing and alkaline cleaning are also available, enabling integrated customization from material selection through to final manufacturing.
For any inquiry, please contact tungsten heater manufacturer: CTIA GROUP
Email: sales@chinatungsten.com
Tel: 0086 592 5129696 / 0086 592 5129595
Website: www.tungsten.com.cn
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